SLA (Stereolithography) minangka proses manufaktur aditif sing dianggo kanthi fokus laser UV menyang tong resin fotopolimer. Kanthi bantuan manufaktur komputer utawa piranti lunak desain dibantu komputer (CAM/CAD), laser UV digunakake kanggo nggambar desain utawa wujud sing wis diprogram menyang permukaan tong fotopolimer. Photopolymers sensitif marang sinar ultraviolet, mula resin dipadhetke kanthi fotokimia lan mbentuk lapisan siji obyek 3D sing dikarepake. Proses iki diulang kanggo saben lapisan desain nganti obyek 3D rampung.
CARMANHAAS bisa nawakake pelanggan sistem optik utamane kalebu Scanner Galvanometer cepet lan lensa pindai F-THETA, Beam expander, Mirror, lsp.
Kepala Scanner Galvo 355nm
Model | PSH14-H | PSH20-H | PSH30-H |
Kepala scan banyu adhem / disegel | ya wis | ya wis | ya wis |
Aperture (mm) | 14 | 20 | 30 |
Sudut Scan Efektif | ± 10° | ± 10° | ± 10° |
Kesalahan nglacak | 0.19 ms | 0,28 ms | 0.45ms |
Wektu Respon Langkah (1% saka skala lengkap) | ≤ 0,4 ms | ≤ 0,6 ms | ≤ 0,9 ms |
Kacepetan khas | |||
Posisi / mlumpat | < 15 m/s | < 12 m/s | < 9 m/s |
Pemindaian garis/raster scanning | < 10 m/s | < 7 m/s | < 4 m/s |
Pemindaian vektor sing khas | < 4 m/s | < 3 m/s | < 2 m/s |
Kualitas Tulisan sing apik | 700 cps | 450 cps | 260 cps |
Kualitas tulisan sing dhuwur | 550 cps | 320 cps | 180 cps |
Precision | |||
Linearitas | 99,9% | 99,9% | 99,9% |
Resolusi | ≤ 1 urad | ≤ 1 urad | ≤ 1 urad |
Repeatability | ≤ 2 urad | ≤ 2 urad | ≤ 2 urad |
Suhu Drift | |||
Offset Drift | ≤ 3 urad/℃ | ≤ 3 urad/℃ | ≤ 3 urad/℃ |
Qver 8 jam Long-Term Offset Drift (Sawise 15 menit warning-up) | ≤ 30 urad | ≤ 30 urad | ≤ 30 urad |
Kisaran Suhu Operasi | 25 ℃ ± 10 ℃ | 25 ℃ ± 10 ℃ | 25 ℃ ± 10 ℃ |
Antarmuka Sinyal | Analog: ± 10 V Digital: protokol XY2-100 | Analog: ± 10 V Digital: protokol XY2-100 | Analog: ± 10 V Digital: protokol XY2-100 |
Kebutuhan Daya Input (DC) | ± 15V @ 4A Max RMS | ± 15V @ 4A Max RMS | ± 15V @ 4A Max RMS |
355nmF-Theta Lensaes
Katrangan bagean | Dawane fokus (mm) | Lapangan Scan (mm) | Max mlebu Pupil (mm) | Jarak kerja (mm) | Pemasangan Utas |
SL-355-360-580 | 580 | 360x360 | 16 | 660 | m85x1 |
SL-355-520-750 | 750 | 520x520 | 10 | 824.4 | m85x1 |
SL-355-610-840-(15CA) | 840 | 610x610 | 15 | 910 | m85x1 |
SL-355-800-1090-(18CA) | 1090 | 800x800 | 18 | 1193 | m85x1 |
355nm Beam Expander
Katrangan bagean | Ekspansi rasio | Input CA (mm) | Output CA (mm) | omah Diameter (mm) | omah dawa (mm) | Pemasangan Utas |
BE3-355-D30:84.5-3x-A(M30*1-M43*0.5) | 3X | 10 | 33 | 46 | 84.5 | M30 * 1-M43 * 0,5 |
BE3-355-D33:84.5-5x-A(M30*1-M43*0.5) | 5X | 10 | 33 | 46 | 84.5 | M30 * 1-M43 * 0,5 |
BE3-355-D33:80.3-7x-A(M30*1-M43*0.5) | 7X | 10 | 33 | 46 | 80.3 | M30 * 1-M43 * 0,5 |
BE3-355-D30:90-8x-A(M30*1-M43*0.5) | 8X | 10 | 33 | 46 | 90.0 | M30 * 1-M43 * 0,5 |
BE3-355-D30:72-10x-A(M30*1-M43*0.5) | 10X | 10 | 33 | 46 | 72.0 | M30 * 1-M43 * 0,5 |
Cermin 355nm Kab
Katrangan bagean | Dhiameter (mm) | Ketebalan (mm) | Lapisan |
355 Pangilon | 30 | 3 | HR@355nm, 45° AOI |
355 Pangilon | 20 | 5 | HR@355nm, 45° AOI |
355 Pangilon | 30 | 5 | HR@355nm, 45° AOI |